News
Elephantech Has Developed SAphire™ B: A Low-Resistance Copper Nanopaste for Inter-Board Connections in High-Layer-Count PCBsAchieves High Reliability Through Low-Temperature Sintering in Ambient Atmosphere
Elephantech announced SAphire™ B, a copper nanopaste designed for inter-board connections in advanced multilayer PCBs.
Elephantech Introduces DS-SAP™ for Fine Patterning on Semiconductor Package SubstratesDual-Seed Technology Enables Higher Density for Advanced AI Packaging
Elephantech has developed DS-SAP™, a novel process for semiconductor package substrates manufacturing. Through independently forming seed layers for surface patterning and via metallization, DS-SAP™ achieves both ultra-thin traces and reliable coverage of high-aspect-ratio vias.
Elephantech Has Developed SAphire™ D02, A Copper Nano-paste for Pressureless Die Attach in Power SemiconductorsAdvancement of its Low-Temperature Sintering Technology Enables Greater Process Flexibility
Elephantech announces the development of SAphire™ D02, a new addition to its SAphire™ low-temperature sintering copper nano-paste lineup, designed for pressureless die attach applications.
Join Elephantech CEO Shinya Shimizu at an IEEE Webinar
On August 6, 2026(PT), Shinya Shimizu, Founder and CEO of Elephantech, will present at a webinar hosted by the IEEE Electronics Packaging Society (EPS) Santa Clara Valley Chapter, an IEEE chapter dedicated to electronics packaging and assembly technologies.
Elephantech Has Developed Copper Nano-Paste
SAphire™ G for Glass Vias in Advanced PackagingLow-Shrinkage and Robust Metallization for High-AR TGVs
Elephantech Inc. has developed "SAphire™ G," a copper nano-paste for Through-Glass Via (TGV) filling, utilizing its proprietary Self-Assembling Copper Nanoparticle (SA-CuNP) technology.
Elephantech Develops DeepVia™ Silicon: A High-Aspect-Ratio Seed Layer Solution for 3D Semiconductor IntegrationA Novel Approach for Silicon Via Seed Layer Formation Addressing Increasing Aspect Ratios
Elephantech has developed a novel approach for forming copper seed layers in high-aspect-ratio (AR) silicon vias, utilizing proprietary copper nanoparticle ink and inkjet printing equipment.
Elephantech Has Developed DeepVia™ HDI Solution for High-Aspect-Ratio Microvia MetallizationEnabling Very High AR ≥ 3 : 1 to Advance AI computing
Elephantech announced the successful development of DeepVia™ HDI, a high-aspect-ratio microvia metallization solution based on its proprietary copper nanoparticle ink and inkjet printing equipment.
Elephantech Selected for NEDO’s “GX Startup-Large Enterprise Collaboration and Funding Acceleration Program”
Elephantech Inc. is pleased to announce its selection for the “GX Sector Startup-Large Enterprise Collaboration and Funding Acceleration Program, Proof of Product Phase under Co-Creation Themes (GX_PoP Phase)”, conducted by the New Energy and Industrial Technology Development Organization (NEDO).
Elephantech Has Developed SAphire™ D, a Copper Sintering Paste for Power Semiconductor Die AttachLow-Temperature Sintering Copper Nanopaste Enabled by Self-Assembling Copper Nanoparticles
Elephantech Inc. today announced the successful development of SAphire™ D, a low-temperature sintering copper nanopaste, based on its proprietary Self-Assembling Copper Nanoparticles (SA-CuNP) technology. The new paste is designed for next-generation power semiconductor die attach process.
Elephantech Unveils HDI Microvia Formation Process Using Copper Nanoparticle InkA Novel Solution for High-Density Board Manufacturing
Elephantech announced successful development of an innovative process to form High-Density Interconnect microvia leveraging the company’s copper nanoparticle ink, named “Cu Nano Direct Plating.”